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1 article(s) from Huq, Ejaz

Charged particle single nanometre manufacturing

Philip D. Prewett,
Cornelis W. Hagen,
Claudia Lenk,
Steve Lenk,
Marcus Kaestner,
Tzvetan Ivanov,
Ahmad Ahmad,
Ivo W. Rangelow,
Xiaoqing Shi,
Stuart A. Boden,
Alex P. G. Robinson,
Dongxu Yang,
Sangeetha Hari,
Marijke Scotuzzi and
Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

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Figure 2: (a) ORION Plus He Ion Microscope from Zeiss AG, located at University of Southampton. (b) Schematic...

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Figure 3: Electron and ion beam substrate penetration – Monte Carlo simulations of charged particle paths sho...

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Figure 4: (a) Spin-coating results for fullerene resists HM-01A and HM-01C using anisole and chlorobenzene so...

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Figure 5: Isolated dose-optimised SHIBL experiments on HM01 fullerene resist: 8 nm wide sparse exposed using ...

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Figure 6: Results of SHIBL at 30 keV beam energy: (a) optical micrograph, (b) AFM image, (c) line profile (HM...

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Figure 7: HIM image of dense (1:1) single-pixel features exposed at (a) 0.09 nC·cm⁻¹ and (b) at 0.04 nC·cm⁻¹ ...

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Figure 8: (a) AFM and (b) corresponding HIM, (c) AFM and (d) corresponding SEM images of doughnuts fabricated...

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Figure 9: (a) Schematic of the multibeam EBL system at TU Delft [45,46]. (b) Experimental multibeam tool using a Nov...

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Figure 10: Schematic of electron beam induced deposition (EBID).

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Figure 11: Schematic representation of the evolution of high-resolution electron beam induced deposition as a ...

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Figure 12: Carbonaceous nanowires on bulk SiO₂ such as the one in (a) slimmed by electron beam induced etching...

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Figure 13: Left: SEM micrograph of an EBID mask consisting of 17 nm lines at 50 nm spacing, transferred into t...

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Figure 14: (a) Thermographic scale representation of the electric field between tip and sample calculated by s...

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Figure 15: (a) SEM image of self-sensing and self-actuated cantilever with the thermomechanical actuator and p...

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Figure 16: (a) Schematic showing feedback loops combined in FE-eSPL tool enabling lithography using the curren...

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Figure 17: Example of stitching test showing an AFM image obtained directly after FE-eSPL exposure, showing ne...

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Figure 18: (a) Results of typical exposure dose test for determination of lithographic tone as a function of t...

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Figure 19: AFM images of FE-eSPL patterning of different materials. (a) MoS₂-flake on SiO₂ substrate placed be...

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Figure 20: Single-digit nanometre features written by FE-eSPL. (a) SEM image obtained after etching of 9 nm th...

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Figure 21: (a, b) SEM images of volcano-gated tip. (c, d) Simulation of the electron beam/trajectories for vol...

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Figure 22: (a) Electron trajectories for 30 keV EBL exposure of 100 nm calixarene film on a Si sample. (b) Ele...

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Figure 23: SEM image of Quattro cantilever array used for parallel AFM imaging with four cantilevers.

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Review

Published 14 Nov 2018

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